Area-Selective Etching of Poly(methyl methacrylate) Films by
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Last updated 11 novembro 2024
Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition
Nanomaterials, Free Full-Text
A review of polymethyl methacrylate (PMMA) as a versatile lithographic resist – With emphasis on UV exposure - ScienceDirect
PDF) Surface Diffusion Control Enables Tailored Aspect Ratio Nanostructures in Area-Selective Atomic Layer Deposition
Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition
Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition
Polymers, Free Full-Text
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Fluorine-containing polymeric inhibitor for highly selective and durable area-selective atomic layer deposition - ScienceDirect
Methyl Methacrylate-Based Copolymers: Recent Developments in the Areas of Transparent and Stretchable Active Matrices
The Use of Block Copolymers in Nanoscale Patterning
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